Á¦24ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ

Final Program

2¿ù 13ÀÏ (¿ù)
2¿ù 13ÀÏ(¿ù) Room A Room B Room C
¿¡¸Þ¶öµå (2Ãþ) ÅäÆÄÁî (2Ãþ) »çÆÄÀ̾î (2Ãþ)
14:00-18:00 [Short Course 1]
Optical Technologies for Metrology and Inspection
[Short Course 2]
2D ¹ÝµµÃ¼¼ÒÀçÀÇ Æ¯¼º ¹× ÀÀ¿ë
[Short Course 3]
Neuromorphic ¼ÒÀÚ ¹× È°¿ë
2¿ù 14ÀÏ(È­)
2¿ù 14ÀÏ(È­) Room A Room B Room C Room D Room E Room F Room G Room H Room I  
2Ãþ 3Ãþ
¿¡¸Þ¶öµå ÅäÆÄÁî »çÆÄÀ̾î Å©¸®½ºÅ» ·çºñ Á¦À̵å ÄÚ·² ´ÙÀ̾Ƹóµå1 ´ÙÀ̾Ƹóµå2 ·Îºñ
08:30-10:00 [TA1-D] [TB1-K] [TC1-G] [TD1-S] [TE1-F]   [TG1-J]     Àü½Ã Chip Design Contest
Hybrid Oxide Thin Films Unconventional Approaches in Resistance Switching Memories Device Physics and Character
-ization 1
Chip Design Contest Advanced CMOS Devices I Graphene
base Nanofabrications
(08:30-10:30)
10:00-10:10 ÈÞ½Ä(&Ä¿ÇÇ, ´Ù°ú)
10:10-11:40 [TA2-D] [TB2-K] [TC2-G] [TD2-E] [TE2-F]   [TG2-J]    
Emerging Thin Film Technology Dielectric, Ferromagnetic, and Phase Change Materials for Memory Application Reliability Analysis WBG High Frequency Device Advanced CMOS Devices II Two-Dimensional Materials beyond Graphene
(10:40-11:40)
11:40-13:00 Á¡½É [Æ÷½ÃÁð / ÁöÇÏ1Ãþ]
13:00-14:00 Plenary Session1 [´ÙÀ̾Ƹóµå1 / 3Ãþ]: Á¤Àº½Â ºÎ»çÀå (»ï¼º¹ÝµµÃ¼¿¬±¸¼Ò)
"The Present and Future of Semiconductor Technology"
14:00-15:00 Plenary Session2 [´ÙÀ̾Ƹóµå1 / 3Ãþ]: Dr. Geoffrey W. Burr (IBM Almaden Research Center, USA)
"Neuromorphic Technologies for Next-Generation Cognitive Computing"
15:00-16:00   [TP1]
Æ÷½ºÅͼ¼¼Ç1
CDC
°ü¶÷½Ã°£

(Core Session)
16:00-17:30 [TA3-D] [TB3-H] [TC3-G] [TD3-E] [TE3-F] [TF3-R] [TG3-J]    
Oxide Thin Film Transistors Display and Imaging Technologies Device Modeling and Simulation 1 WBG Power Device Flash and Si Memory Technologies Semiconductor Software 1 Two-Dimensional Materials beyond Graphene
18:00-20:00 ¸¸Âù [´ÙÀ̾Ƹóµå1 / 3Ãþ]
20:00-22:00 Rump Session 1 [¿¡¸Þ¶öµå / 2Ãþ] ÀúÀü·Â ÀΰøÁö´ÉÀ» À§ÇÑ ´º·Î¸ðÇÈ ±â¼úÀÇ Àü¸Á
Rump Session 2 [ÅäÆÄÁî / 2Ãþ] Smart Cars: The Next Growth Engine for the Semiconductor Industry
Rump Session 3 [»çÆÄÀ̾î / 2Ãþ] ¹ÝµµÃ¼ ½ºÄÉÀϸµÀÇ ÇâÈÄ Àü¸Á°ú ±â¼ú °úÁ¦
2¿ù 15ÀÏ(¼ö)
2¿ù 15ÀÏ(¼ö) Room A Room B Room C Room D Room E Room F Room G Room H Room I  
2Ãþ 3Ãþ
¿¡¸Þ¶öµå ÅäÆÄÁî »çÆÄÀ̾î Å©¸®½ºÅ» ·çºñ Á¦À̵å ÄÚ·² ´ÙÀ̾Ƹóµå1 ´ÙÀ̾Ƹóµå2 ·Îºñ
08:30-10:00 [WA1-D] [WB1-A] [WC1-G] [WD1-I] [WE1-F] [WF1-B] [WG1-C] [WH1-O]   Àü½Ã
Thin Films for Memories and Transistors Packaging and Design Device Physics and Character
-ization 2
Flexible Sensors Advanced CMOS Processing and Reliability Plasma and Patterning Processes Materials Growth & Character
-ization I
VLSI System Design and Applications 1
10:00-10:10 ÈÞ½Ä (& Ä¿ÇÇ, ´Ù°ú)
10:10-11:40 [WA2-D] [WB2-A] [WC2-G] [WD2-I] [WE2-F] [WF2-B] [WG2-C] [WH2-O]  
2D Materials and Devices Process issues of Interconnect Device Modeling and Simulation 2 Bio/Gas/Pressure Sensors Flash and Si Memory Technologies Patterning and Lithography Materials Growth & Character
-ization II
VLSI System Design and Applications 2
11:40-12:40 Á¡½É [Æ÷½ÃÁð / ÁöÇÏ1Ãþ]
12:40-14:25 [WA3-D] [WB3-K] [WC3-Q] [WD3-I] [WE3-F] [WF3-R] [WG3-J] [WH3-M]  
ALD/CVD Thin Films Resistance Switching Memories Metrology and Inspection (I) FET-based sensors Advanced CMOS Integrated Circuits Semiconductor Software 2 Nanofabrication for Next Generation Device Applications RF and Wireless System and Components
14:25-15:25                 [WP1]
Æ÷½ºÅͼ¼¼Ç2
15:25-17:10 [WA4-P] [WB4-K] [WC4-Q] [WD4-E] [WE4-L] [WF4-R] [WG4-J] [WH4-N]  
Materials and Devices for Energy Understanding Resistance Switching Phenomena Metrology and Inspection(II) WBG Chharacterization Technology Analog Circuit Design Semiconductor Software 3 Nanofabrication for Next Generation Device Applications Advances in Design Automation and Test
Æ÷½ºÅͼ¼¼Ç1 D,F,G,H,K,S
Æ÷½ºÅͼ¼¼Ç2 A,B,C,E,I,J,L,M,N,O,P,Q,R

±¸µÎ¹ßÇ¥ ¼¼¼Ç±âÈ£ º¸´Â ¹ý

¿äÀÏ ¼¼¼Ç·ë ¼¼¼Ç¼ø¼­ ºÐ°ú
T È­¿äÀÏ A Room A 1 ù¹ø° ¼¼¼Ç A I Q
W ¼ö¿äÀÏ B Room B 2 µÎ¹ø° ¼¼¼Ç B J R
    C Room C 3 ¼¼º¯Â° ¼¼¼Ç C K S
    D Room D 4 ³×¹ø° ¼¼¼Ç D L  
    E Room E     E M  
    F Room F     F N  
    G Room G     G O  
    H Room H     H P  

¡Ø TA1-D: È­¿äÀÏ Room A¿¡¼­ ù¹ø°·Î ÁøÇàµÇ´Â DºÐ°ú ¼¼¼Ç
¡Ø TA1-D-1: È­¿äÀÏ Room A¿¡¼­ ù¹ø°·Î ÁøÇàµÇ´Â DºÐ°ú ¼¼¼ÇÀÇ Ã¹¹ø° ¹ßÇ¥

ºÐ°ú¸í
A Interconnect & Package
B Patterning
C Materials Growth & Characterization
D Thin Film Process Technology
E Compound Semiconductors
F Silicon and Group-IV Devices and Integration Technology
G Device & Process Modeling, Simulation and Reliability
H Display and Imaging Technologies
I MEMS & Sensor Systems
J Nano-Science & Technology
K Memory (Design & Process Technology)
L Analog Design
M RF and Wireless Design
N VLSI CAD
O System LSI Design
P Device for Energy (Solar Cell, Power Device, Battery, etc.)
Q Metrology, Inspection, and Yield Enhancement
R Semiconductor Software
S Chip Design Contest